APT-NIST

About

During 2001 Excellatron was awarded a contract by the U.S. Department of Commerce Advanced Technology Program (ATP) at the National Institute of Standards and Technology (NIST). The project was intended to conduct research and development of plasma-enhanced chemical vapor deposition (PECVD) technology for the manufacture of thin film batteries.
The research has exceeded expectations.We not only achieved the objectives of the project, but also explored various new materials for use in thin film batteries.With the development of this novel technology, Excellatron can produce thin film batteries at a much faster rate and at a much lower cost than with other technologies. Three patents have been filed on the PECVD deposition technology for thin film batteries. Operational thin film batteries deposited by the PECVD process have been successfully prepared.

The primary achievements of this project include:

  • Successful deposition of solid state electrolyte by the PECVD process with a high deposition rate (4 times faster than sputter deposition). The electrolyte has an ionic conductivity of 5.8*10-6 S/cm (three times higher than sputtered LiPON electrolyte)
  • Successful deposition of high capacity anode films (2,250 mAh/g, which is 6 times as large as graphite anode)
  • Preparation of both V2O5and LiCoO2 cathodes by the PECVD process
  • Three patent applications have been filed under the ATP project

In addition to the technical achievements accomplished through participation in the ATP program, Excellatron has benefited significantly from a business and organizational perspective. The high credibility of the program has generated interest in our technology by several organizations.

Excellatron

A U.S. based technology company, is introducing innovative and enabling energy storage technology.


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